Room-temperature several-hundred-of-megahertz charge sensing with single-electron resolution using a silicon transistor

A Silicon Single-Electron Transistor Memory Operating at Room Temperature

A single-electron memory, in which a bit of information is stored by one electron, is demonstrated at room temperature. The memory is a floating gate metal-oxide-semiconductor transistor in silicon with a channel width ( approximately 10 nanometers) smaller than the Debye screening length of a single electron and a nanoscale polysilicon dot ( approximately 7 nanometers by 7 nanometers) as the f...

The Analysis of Coulomb Blockade in Fullerene Single Electron Transistor at Room Temperature

The Graphene based single electron transistor (SET) as a coulomb blockade device need to be explored .It is a unique device for high-speed operation in a nano scale regime. A single electron transfers via the coulomb barriers, but its movement may be prevented by coulomb blockade, so its effect is investigated in this research. The conditions of coulomb blockade and its controlling factors such...

Fabrication and characterization of room temperature silicon single electron memory

A single electron memory was demonstrated in crystalline silicon that has a transistor channel width of ;10 nm and a nanoscale floating gate of dimension ;~7 nm 3 7 nm 3 2 nm!, patterned by electron beam lithography, lift-off, and reactive ion etching. Quantized shift in the threshold voltage and self-limited charging process have been observed at room temperature. Analysis has shown that these...

Charge sensitivity of superconducting single-electron transistor

It is shown that the noise-limited charge sensitivity of a single-electron transistor using superconductors (of either SISIS or NISIN type) operating near the threshold of quasiparticle tunneling, can be considerably higher than that of a similar transistor made of normal metals or semiconductors. The reason is that the superconducting energy gap, in contrast to the Coulomb blockade, is not sme...

Development of room temperature operating single electron transistor using FIB etching and deposition technology